Effect of VC Doping on Diffusion Mechanism at WC/Co Interface-Reference-Cited by-同舟云学术

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Effect of VC Doping on Diffusion Mechanism at WC/Co Interface

Published:2020-01-15 Issue:1 Volume:67 Page:3-9
ISSN:0532-8799
Container-title:Journal of the Japan Society of Powder and Powder Metallurgy
language:en
Short-container-title:J. Jpn. Soc. Powder Powder Metallurgy

Author:

NAKAYAMA Hiroyuki¹,OZAKI Kimihiro¹

Affiliation:

1. Magnetic Powder Metallurgy Research Center, National Institute of Advanced Industrial Science and Technology

Publisher

Japan Society of Powder and Powder Metallurgy

Subject

Materials Chemistry,Metals and Alloys,Industrial and Manufacturing Engineering,Mechanical Engineering

Link

https://www.jstage.jst.go.jp/article/jjspm/67/1/67_3/_pdf

Reference20 articles.

1. 1) M. Kawakami, O. Terada, K. Hayashi: J. Jpn. Soc. Powder Powder Metallurgy, 51 (2004) 576-585.

2. 2) M. Kawakami, K. Kitamura: Materials Transactions, 56 (2015) 1880-1886.

3. 3) K. Okada a, A. Osada: Int. Journal of Refractory Metals and Hard Materials, 62 (2017) 149-154.

4. 4) I. Sugiyama, Y. Mizumukai, T. Taniuchi, K. Okada, F. Shirase, T. Tanase, Y. Ikuhara, T. Yamamoto: Int. Journal of Refractory Metals and Hard Materials, 30 (2012) 185-187.

5. 5) O. Lavergne, F. Robaut, F. Hodaj, C. H. Allibert: Acta Materialia, 50 (2002) 1683–1692.

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