Preparation of Monosized Silicon Micro Particles by Pulsated Orifice Ejection Method-Reference-Cited by-同舟云学术

Preparation of Monosized Silicon Micro Particles by Pulsated Orifice Ejection Method

Published:2006 Issue:4 Volume:53 Page:346-351
ISSN:0532-8799
Container-title:Journal of the Japan Society of Powder and Powder Metallurgy
language:
Short-container-title:J. Jpn. Soc. Powder Powder Metallurgy

Author:

Dong Wei,Takagi Kenta,Masuda Satoshi,Kawasaki Akira

Publisher

Japan Society of Powder and Powder Metallurgy

Subject

Materials Chemistry,Metals and Alloys,Industrial and Manufacturing Engineering,Mechanical Engineering

Reference15 articles.

1. 1) N. Takeda: "Ball semiconductor technology and its application to MEMS", Proceedings of IEEE/ MEMS 2000, Miyazaki, (2000) 11-16.

2. 2) R. Toda, N. Takeda, T. Murakoshi, S. Nakamura and M. Esashi: "Electrostatically levitated spherical 3-axis accelerometer", Technical Digest of MEMS'02, Las Vegas, (2002) 710-713.

3. Fabrication of a three-dimensional terahertz photonic crystal using monosized spherical particles

4. Optimization of Process Parameters for Preparing Honodisperse Particles by Pulsated Orifice Injection Method.

5. Preparation of Monosized Metal Powders by Pulsated Orifice Injection.

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