Analysis of Surface Layers and Thin Films by Low Incident Angle X-Ray Diffraction

Author:

Iyengar S. S.,Santana M. W.,Windischmann H.,Engler P.

Abstract

Due to the current high interest in characterizing epitaxially deposited thin films required by the electronics industry as well as the increased attention in elucidating reactions between solid surfaces and the environment (e.g., corrosion), investigators have increased their efforts in developing X-ray procedures for analyzing films and surfaces less than 2 μm thick. For example, an entire session of the 1985 Denver Conference on Applications of X-ray Analysis was devoted to this subject and an excellent review of X-ray diffraction techniques for characterizing thin films was recently published by Segmuller (1). Specific techniques include grazing incidence diffraction (2, 3), double crystal diffraction (3), and the use of the Seemann-Bohlin focusing geometry (4, 5).

Publisher

Cambridge University Press (CUP)

Reference6 articles.

1. Segmuller A. , “Characterization of Epitaxial Films by X-ray Diffraction”, in “Advances in X-ray Analysis”, in press.

2. CHARACTERIZATION OF THIN FILMS BY X-RAY DIFFRACTION

3. Seemann–Bohlin X-ray diffractometry. I. Instrumentation

4. Matyi R.J. , “Characterization of Tungsten Silicid e and Titanium Silicide Thin Films with a Fully Automated Seemann-BohIin Diffractometer ”, in “Advances in X-ray Analysis”, in press.

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. SOME ADVANCES IN X-RAY ANALYSIS OF THIN FILMS;Frontiers of Materials Research: Electronic and Optical Materials;1991

2. X-Ray Diffraction Studies of Polycrystalline Thin Films Using Glancing Angle Diffractometry;Advances in X-Ray Analysis;1989

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