Design of an etch-resistant cyclic olefin photoresist-Reference-Cited by-同舟云学术

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Design of an etch-resistant cyclic olefin photoresist

Published:1998-06-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Allen Robert D.,Opitz Juliann,Wallow Thomas I.,Di Pietro Richard A.,Hofer Donald C.,Jayaraman Saikumar,Hullihan Karen A.,Rhodes Larry F.,Goodall Brian L.,Shick Robert A.

Publisher

SPIE

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Addition polymerization of functionalized norbornenes as a powerful tool for assembling molecular moieties of new polymers with versatile properties;Progress in Polymer Science;2018-09

2. Laser micro-engineering of functionalised cyclic olefin polymers for microfluidic applications;Laser-based Micro- and Nanoprocessing IX;2015-03-12

3. Effects of Plasma and Wet Processes on Si-Rich Anti-Reflective Coating to Address Selective Trilayer Rework for Sub-20nm Technology Nodes;ECS Transactions;2013-08-31

4. Lithography resists;Lithography;2013-03-07

5. Rational design in cyclic olefin resists for sub-100-nm lithography;Advances in Resist Technology and Processing XX;2003-06-11

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