The study of relationship between defect sensitivity and inspectability on EUV masks with 19x nm mask inspection-Reference-Cited by-同舟云学术

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The study of relationship between defect sensitivity and inspectability on EUV masks with 19x nm mask inspection

Published:2019-06-27 Issue: Volume: Page:
ISSN:
Container-title:Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
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Author:

Yonetani Masashi,Badger Karen D.,Rankin Jed,Akima Shinji,Toda Yusuke,Yoshida Itaru,Kagawa Masayuki,Isogawa Takeshi,Kodera Yutaka,Heumann Jan,Birnstein Anka

Publisher

SPIE

Reference9 articles.

1. DUV inspection beyond optical resolution limit for EUV mask of hp 1X nm;Masato,2017

2. DUV inspection tool application for beyond optical resolution limit pattern;Hiromu,2015

3. Inspection of advanced computational lithography logic reticles using a 193-nm inspection system;Ching-Fang,2010

4. EUV mask inspection with 193 nm inspector for 32 and 22 nm HP;Daniel,2010

5. Reflecting on inspectability and wafer printability of EUV mask absorbers;Kazunori,2013

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