Study on surface integrity in photomask resist strip and final cleaning processes
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SPIE
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Contamination Removal From UV and EUV Photomasks;Developments in Surface Contamination and Cleaning, Volume 9;2017
2. A chemical analysis method to identify the source of pellicle adhesive contaminants;Surface and Interface Analysis;2014-04-10
3. Removal of UV Cured Resin Using Hybrid Cleaning Method;Solid State Phenomena;2012-12
4. Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask;Japanese Journal of Applied Physics;2012-09-01
5. Cleaning of step-and-flash imprint masks with damage-free nonacid technology;Journal of Micro/Nanolithography, MEMS, and MOEMS;2010-07-01
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