Direct femtosecond laser lithography for photoresist patterning
Author:
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference11 articles.
1. Machining of sub-micron holes using a femtosecond laser at 800 nm
2. Towards nanostructuring with femtosecond laser pulses
3. Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser
4. Maskless nonlinear lithography with femtosecond laser pulses
5. Lithography and Other Patterning Techniques for Future Electronics
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1. Two-photon shape-modulated maskless lithography of positive photoresist of S1813;Optical Materials;2023-03
2. Fast Fabrication of Large-Area Two-Dimensional Micro/Nanostructure by Femtosecond Laser;Laser & Optoelectronics Progress;2020
3. Fabrication of TiO2 Thin Film-Based Fresnel Zone Plates by Nanosecond Laser Direct Writing;Journal of Micro and Nano-Manufacturing;2017-12-14
4. Fabrication of large-scale multilevel phase-type Fresnel zone plate arrays by femtosecond laser direct writing;Optics Communications;2016-03
5. Multiphoton Process in Nanofabrication and Microscopy Imaging;Nano-Optics and Nanophotonics;2014-11-06
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