Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles-Reference-Cited by-同舟云学术

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Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles

Published:2021-05-28 Issue:02 Volume:20 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Severi Joren¹,Welling Ulrich²,De Simone Danilo³,De Gendt Stefan¹

Affiliation:

1. KU Leuven, Department of Chemistry, Leuven

2. Synopsys GmbH, Munich

3. Imec, Department of Advanced Patterning, Leuven

Publisher

SPIE-Intl Soc Optical Eng

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hyper NA EUV lithography: an imaging perspective;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-14

2. Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-10-13

3. Analytical approach to metal oxide resist modeling: exposure, bake, and network formation;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-08-17

4. Unbiased line edge roughness measurement using profile-averaging method for precise roughness parameters measurement;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-30

5. Resist line edge roughness mitigation at high-NA EUVL;Advances in Patterning Materials and Processes XXXIX;2022-05-25

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