Modeling of ablation threshold dependence on pulse duration for dielectrics with ultrashort pulsed laser-Reference-Cited by-同舟云学术

Modeling of ablation threshold dependence on pulse duration for dielectrics with ultrashort pulsed laser

Published:2016-11-30 Issue:1 Volume:56 Page:011026
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Sun Mingying¹,Zhu Jianqiang²,Lin Zunqi²

Affiliation:

1. Shanghai Institute of Optics and Fine Mechanics, Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences, No. 390, Qinghe Road, Jiading District, Shanghai 201800, ChinabElectronic Engineering Institute, State Key Laboratory of Pulsed Power Laser Technology, No. 460, Huangshan Road, Hefei, Anhui 230037, China

2. Shanghai Institute of Optics and Fine Mechanics, Key Laboratory of High Power Laser and Physics, Chinese Academy of Sciences, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference54 articles.

1. Femtosecond laser micromachining in transparent materials

2. Micromachining of photonic devices by femtosecond laser pulses

3. Femtosecond laser damage resistance of oxide and mixture oxide optical coatings

4. Wavelength dependence of femtosecond laser-induced damage threshold of optical materials

5. Femtosecond-laser ablation dynamics of dielectrics: basics and applications for thin films

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