1. Performance results of a new generation of 300 mm lithography systems;Sluijk,2001
2. The performance advantages of a dual-stage system
3. Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier;Burry,2012
4. Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface;Staals,2013
5. NXT:1980Di immersion scanner for 7nm and 5nm production nodes