Verification metrology system by using inline reference metrology-Reference-Cited by-同舟云学术

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Verification metrology system by using inline reference metrology

Published:2014-10-02 Issue:4 Volume:13 Page:041405
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Abe Hideaki¹,Ishibashi Yasuhiko¹,Ida Chihiro¹,Hamaguchi Akira¹,Ikeda Takahiro²,Yamazaki Yuichiro¹

Affiliation:

1. Toshiba Corporation, Analysis Inspection and Metrology Engineering Department, Yamanoisshiki-Cho, Yokkaichi 512-8550, Japan

2. Toshiba Corporation, Center for Semiconductor Research & Development, Komukai-Toshiba-Cho, Saiwai-Ku, Kawasaki 212-8583, Japan

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Scatterometry measurement precision and accuracy below 70 nm

2. Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

3. In-line CD metrology with combined use of scatterometry and CD-SEM

4. A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

5. Characterization of cross sectional profile of nanostructure line grating using small angle x-ray scattering

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