Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography-Reference-Cited by-同舟云学术

Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

Published:2014-10-21 Issue:4 Volume:13 Page:043003
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Thesen Manuel W.¹,Nees Dieter²,Ruttloff Stephan²,Rumler Maximilian³,Rommel Mathias³,Schlachter Florian⁴,Grützner Susanne¹,Vogler Marko¹,Schleunitz Arne¹,Grützner Gabi¹

Affiliation:

1. micro resist technology GmbH, Koepenicker Str. 325, Berlin, 12555, Germany

2. Joanneum Research Materials, Institute for Surface Technologies and Photonics, Franz-Pichler-Straße 30, Weiz, 8160, Austria

3. Fraunhofer Institute for Integrated Systems and Device Technology IISB, Schottkystrasse 10, Erlangen, 91058, Germany

4. AMO GmbH, Otto-Blumenthal-Str. 25, Aachen, 52074, Germany

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Mold-assisted nanolithography: A process for reliable pattern replication

3. Fast fabrication of nano-structured anti-reflection layers for enhancement of solar cells performance using plasma sputtering and infrared assisted roller embossing techniques

4. Nanofeatured anti-reflective films manufactured using hot roller imprinting and self-assembly nanosphere lithography

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