Efficient source mask optimization using multipole source representation-Reference-Cited by-同舟云学术

Efficient source mask optimization using multipole source representation

Published:2014-10-02 Issue:4 Volume:13 Page:043001
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Yang Chaoxing¹,Li Sikun²,Wang Xiangzhao¹

Affiliation:

1. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, No. 390 Qinghe Road, Shanghai 201800, ChinabUniversity of Chinese Academy of Sciences, Shanghai Institute of Opt

2. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Information Optics and Opto-Electronic Technology, No. 390 Qinghe Road, Shanghai 201800, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. The International Technology Roadmap for Semiconductors (ITRS), 2009 edition,2010

2. Optimum mask and source patterns to print a given shape

3. Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

4. Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm

5. Source optimization for image fidelity and throughput

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