Line edge and width roughness smoothing by plasma treatment-Reference-Cited by-同舟云学术

Line edge and width roughness smoothing by plasma treatment

Published:2014-05-19 Issue:2 Volume:13 Page:023006
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

De Schepper Peter¹,Hansen Terje¹,Altamirano-Sanchez Efrain²,Pret Alessandro Vaglio³,el Otell Ziad¹,Boulart Werner²,De Gendt Stefan¹

Affiliation:

1. Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, BelgiumbKatholieke Universiteit Leuven (KULeuven), Department of Chemistry, 3001 Leuven, Belgium

2. Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, Belgium

3. Interuniversitair Microelectronica Centrum, Kapeldreef 75, 3001 Leuven, BelgiumcKLA-Tencor, Process Control Information Division, Research Park Haasrode 1112, Esperantolaan 8, 3001 Leuven, Belgium

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference43 articles.

1. Impact of line-width roughness on Intel's 65-nm process devices

2. Critical challenges for EUV resist materials

3. International technology roadmap for semiconductors,2013

4. Dry etching challenges for patterning smooth lines: LWR reduction of extreme ultra violet photo resist

5. Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stochastic effects in EUV lithography: random, local CD variability, and printing failures;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-12-29

2. Understanding the efficacy of linewidth roughness postprocessing;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-07-14

3. Understanding the efficacy of linewidth roughness post-processing;Advances in Patterning Materials and Processes XXXII;2015-03-20

4. Molecular glass resist performance for nano-pattern transfer;SPIE Proceedings;2015-03-17

5. H2plasma and neutral beam treatment of EUV photoresist;SPIE Proceedings;2015-03-17