Introduction of new visual analysis program using defect image segmentation for EUV mask mass product at modern load port

Author:

Lee Hyunjoo,Kim Kyunghyun,Shim Yeongjun,Choi Jinsung,Sung Jaewhan,Lee Sanghee .

Publisher

SPIE

Reference8 articles.

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2. Almost Everything One Needs to Know About Image Matching Systems, Proceedings Volume 0238, Image Processing for Missile Guidance; (1980). 24th Annual Technical Symposium, 1980, San Diego, United States

3. A NEW APPROACH TO IMAGE FEATURE DETECTION WITH APPLICATIONS1, Pattern Recognition, Vol. 29, No. 4, pp. 627–640, 1996, Copyright © 1996 Pattern Recognition Society

4. Digital Image Processing 4th EDITION, Rafael C. Gonzalez ” Richard E. Woods

5. Industry survey of automatic defect classification technologies, methods, and performance, Proc. SPIE 4692, Design, Process Integration, and Characterization for Microelectronics, (12 July 2002)

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