Author:
Alkoken Ran,Baram Mor,Oron Gadi,Schuch Nivea G.,Robert Frederic,Figueiro Thiago,Brand Omri,Geta Matan,Saha Kasturi,Miller Elias,Zavhon Tal,Tewari Dipayan,Singh Deepakkumar,Kumar Sarkar Sujan,Lorusso Gian F.,Beral Christophe,Wei Chih-I,Curvacho Gabriel,Kim Young Chang,Fenger Germain L.
Reference7 articles.
1. Effects of 0.55NA EUV material stack on eBeam metrology performance;Alkoken,2023
2. Resist shrink characterization methodology for more accurate CD metrology;Breton,2022
3. Calibration of compact OPC models using SEM contours;Granik,2005
4. Intensive 2D SEM model calibration for 45nm and beyond;Bailey,2006
5. Two-dimensional image-based model calibration for OPC applications
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Trends in e-beam metrology and inspection;Metrology, Inspection, and Process Control XXXVIII;2024-04-10