High-refractive-index fluids for the next-generation ArF immersion lithography-Reference-Cited by-同舟云学术

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High-refractive-index fluids for the next-generation ArF immersion lithography

Published:2006-03-10 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Wang Yong,Miyamatsu Takashi,Furukawa Taiichi,Yamada Kinji,Tominaga Tetsuo,Makita Yutaka,Nakagawa Hiroki,Nakamura Atsushi,Shima Motoyuki,Kusumoto Shiro,Shimokawa Tsutomu,Hieda Katsuhiko

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advanced Fabrication Methods and Techniques;Nanofluidics and Microfluidics;2014

2. Patterning by Photolithography;Functional Polymer Films;2011-06-07

3. Advances in Patterning Materials for 193 nm Immersion Lithography;Chemical Reviews;2010-01-13

4. High refractive index nanoparticle fluids for 193-nm immersion lithography;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

5. An Update on the Progress in High-n Immersion Lithography;Journal of Photopolymer Science and Technology;2008

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