Prevention of chemical residue from growing into Haze defect on PSM pattern edge after normal cleaning process
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SPIE
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Haze and pellicle material selection for haze free;35th European Mask and Lithography Conference (EMLC 2019);2019-08-29
2. Contamination Removal From UV and EUV Photomasks;Developments in Surface Contamination and Cleaning, Volume 9;2017
3. Formation mechanism of the photomask blanks material related haze;SPIE Proceedings;2016-05-20
4. Surface modification of the MoSiON phase shift mask to reduce critical dimension variation;Applied Surface Science;2013-10
5. Progressive defects caused by crosstalk between mask fabrication processes;SPIE Proceedings;2013-06-28
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