Author:
Carcia Peter F.,French Roger H.,Reynolds Gillian A. M.,Hughes Greg P.,Torardi Charlie C.,Reilly M. H.,Lemon M. F.,Miao C. R.,Jones David J.,Wilson L.,Dieu Laurent
Cited by
2 articles.
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1. Mask Materials;Handbook of Photomask Manufacturing Technology;2005-04-07
2. Attenuating phase-shifting mask at 157 nm;SPIE Proceedings;2002-07-15