Multi-beam mask writer MBM-2000PLUS-Reference-Cited by-同舟云学术

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Multi-beam mask writer MBM-2000PLUS

Published:2022-09-16 Issue: Volume: Page:
ISSN:
Container-title:Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology
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Author:

Nomura Haruyuki,Matsumoto Hiroshi,Yamaguchi Keisuke,Kimura Hayato,Nakahashi Satoshi,Nakayamada Noriaki

Publisher

SPIE

Reference8 articles.

1. Multi-beam mask writer, MBM-2000;Matsumoto,2021

2. Accurate models for EUV lithography;Hendrickx,2009

3. Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness;Yu,2005

4. EBM-5000: Electron beam mask writer for 45 nm node;Sunaoshi,2005

5. Future Mask Writers Requirements for the sub 10nm Node Era;Chandramouli,2012

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent progress and future of electron multi-beam mask writer;Japanese Journal of Applied Physics;2023-02-17

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