Enhanced wafer overlay residuals control; deep sub-nanometer at sub-millimeter lateral resolution-Reference-Cited by-同舟云学术

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Enhanced wafer overlay residuals control; deep sub-nanometer at sub-millimeter lateral resolution

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Metrology, Inspection, and Process Control for Microlithography XXXIII
language:
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Author:

Cohen Avi,Leray Philippe,Canga Eren,Dmitriev Vladimir,Gorhad Kujan,Sufrin Yael

Publisher

SPIE

Reference5 articles.

1. Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes;Verstappen,2016

2. Correcting Image Placement Error Using Registration Control (RegC®) Technology;Graitzer,2011

3. RegC™: A new Registration Control process for Photomasks after Pattern Generation;Graitzer,2011

4. Co-optimization of RegC® and TWINSCANTM corrections to improve the intra-field on-product overlay performance;Avizemer,2016

5. Improving mask registration and wafer overlay control using an ultrashort pulsed laser

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improve photomask writing error using Registration Correction (RegC) technology;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26

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