Study of nanoimprint lithography for applications toward 22nm node CMOS devices-Reference-Cited by-同舟云学术

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Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yoneda Ikuo,Mikami Shinji,Ota Takumi,Koshiba Takeshi,Ito Masamitsu,Nakasugi Tetsuro,Higashiki Tatsuhiko

Publisher

SPIE

Cited by 39 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrical evaluation of copper damascene interconnects based on nanoimprint lithography compared with ArF immersion lithography for back-end-of-line process;Japanese Journal of Applied Physics;2024-02-20

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3. Application of Nanooptics in Photographic Imagery and Medical Imaging;Journal of Chemistry;2021-09-28

4. Particle and pattern discriminant freeze-cleaning method;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-10-06

5. Meniscus behavior under helium exposure for rapid resist spreading during nanoimprint lithography;Japanese Journal of Applied Physics;2018-09-21

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