Multilayer and multiproduct masks: cost reduction methodology

Author:

Balasinski Artur P.

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Cost-driven mask strategies considering parametric yield, defectivity, and production volume;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-07-01

2. New Yield-Aware Mask Strategies;PROC SPIE;2011

3. Lens aberration aware placement for timing yield;ACM Transactions on Design Automation of Electronic Systems;2009-01

4. Photomask Manufacturing: An Example of Synchronized Ecosystem Learning;PICMET '07 - 2007 Portland International Conference on Management of Engineering & Technology;2007-08

5. Enhanced Design Flow and Optimizations for Multiproject Wafers;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2007-02

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