Author:
Portnichenko Pavlo,Oezdogan Ferhat,Dawahre Lamia,Lohse Oliver,Kalsbeck Bill,Jain Priyank,Steigerwald Hendrik,Ismail Sharif,Laske Frank
Reference10 articles.
1. International Roadmap for Devices and Systems™ https://irds.ieee.org/.
2. EUV mask defects and their removal;Rastegar,2012
3. John Burns and Mansoor Abbas “EUV mask defect mitigation through pattern placement”, Proc. SPIE 7823, 782340 (2010).
4. Defect mitigation considerations for EUV photomasks
5. Comprehensive defect avoidance framework for mitigating EUV mask defects;Ali Kagalwalla,2014