Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance-Reference-Cited by-同舟云学术

Nanoimprint system development for high-volume semiconductor manufacturing the and status of overlay performance

Published:2017-03-21 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Takabayashi Yukio¹,Hiura Mitsuru¹,Morohoshi Hiroshi¹,Kodachi Nobuhiro¹,Hayashi Tatsuya¹,Kimura Atsushi¹,Yoshida Takahiro¹,Mishima Kazuhiko¹,Suzaki Yoshio¹,Choi Jin²

Affiliation:

1. Canon Inc. (Japan)

2. Canon Nanotechnologies, Inc. (United States)

Publisher

SPIE

Reference15 articles.

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4. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Proc. SPIE, Emerging Lithographic Technologies III, 379 (1999).

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