III-V semiconductor quantum well and superlattice detectors-Reference-Cited by-同舟云学术

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III-V semiconductor quantum well and superlattice detectors

Published:1998-10-26 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Walther Martin,Fuchs Frank,Schneider Harald,Fleissner Joachim,Schmitz J.,Pletschen Wilfried,Braunstein Juergen,Ziegler Johann,Cabanski Wolfgang A.,Koidl Peter,Weimann Guenter

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Performance Comparison of Long-Wavelength Infrared Type II Superlattice Devices with HgCdTe;Journal of Electronic Materials;2011-05-04

2. Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies;Journal of Micromechanics and Microengineering;2003-01-13

3. Deep dry etching of GaAs and GaSb using Cl[sub 2]/Ar plasma discharges;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

4. Infrared detectors: status and trends;Progress in Quantum Electronics;2003-01

5. High-resolution QWIP FPAs for the 8- to 12-μm and 3- to 5-μm regimes;SPIE Proceedings;2003-01-01

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