Etching selectivity control during resist pattern transfer into silica for the fabrication of microlenses with reduced spherical aberration-Reference-Cited by-同舟云学术

Etching selectivity control during resist pattern transfer into silica for the fabrication of microlenses with reduced spherical aberration

Published:1999-01-01 Issue:1 Volume:38 Page:146
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Severi Marco

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference13 articles.

1. Technique for monolithic fabrication of microlens arrays

2. The manufacture of microlenses by melting photoresist

3. Microlens arrays etched into glass and silicon

4. Fabrication of refractive microlens arrays

5. R. Völkel, P. Nussbaum, K. J. Weible, H. P. Herzig, R. Dänliker, S. Haselbeck, M. Eisner, and J. Schwider, “Fabrication of non-conventional microlens arrays,” inEOS Topl. Mtg. Digest Ser.: Microlens Arrays, P1, pp. 116–120 (1995).

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