Improved Bilayer Resist System Using Contrast-Enhanced Lithography With Water-Soluble Photopolymer-Reference-Cited by-同舟云学术

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Improved Bilayer Resist System Using Contrast-Enhanced Lithography With Water-Soluble Photopolymer

Published:1986-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing III
language:
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Author:

Sasago Masaru¹,Endo Masayuki¹,Hirai Yoshihiko¹,Ogawa Kazufurni¹,Ishihara Takeshi¹

Affiliation:

1. Matsushita Electric Industrial Co., Ltd. (Japan)

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Isopropanol/water as a developer for poly(dimethylglutarimide);Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-10-01

2. Exposure and development of thick polydimethylglutarimide films for MEMS applications using 254-nm irradiation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-04-01

3. Lithography for High Energy Technology in Microelectronics;High Energy Density Technologies in Materials Science;1990

4. Water-Soluble contrast enhancing materials?new photobleachable dyes;Polymer Engineering and Science;1989-08

5. High-Aspect-Ratio Alkaline Surface Treatment Method of Dyed Photoresist;Japanese Journal of Applied Physics;1989-03-20

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