The formation of photoresist film with thicknesses from 0.7 microns to 100 microns on surfaces with considerable relief by spray coating on the heated substrate

Author:

Romashkin Alexey V.1,Levin Denis D.1,Rozanov Roman Yu.1,Nevolin Vladimir K.1

Affiliation:

1. National Research Univ. of Electronic Technology (Russian Federation)

Publisher

SPIE

Reference7 articles.

1. Spray coating of photoresist for pattern transfer on high topography surfaces

2. Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography

3. Photoresist coating and patterning for through-silicon via technology

4. Spray coating of photoresist for 3D microstructures with different geometries;Yu;Journal of Physics: Conference Series,2006

5. Optimization of spray coating photoresist for high topography surfaces;Lee,2005

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