Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes-Reference-Cited by-同舟云学术

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Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Published:2014-03-31 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Moriya Masato,Ochiai Hideyuki,Watabe Yoshinobu,Ishida Keisuke,Masuda Hiroyuki,Sasaki Youichi,Kumazaki Takahito,Kurosu Akihiko,Ohta Takeshi,Kakizaki Kouji,Matsunaga Takashi,Mizoguchi Hakaru

Publisher

SPIE

Reference2 articles.

1. Enhancing lithography process control through advanced, on-board beam parameter metrology for wafer level monitoring of light source parameters;Choi,2012

2. Lithography imaging control by enhanced monitoring of light source performance;Alagna,2013

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography;SPIE Proceedings;2015-03-18

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