Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis-Reference-Cited by-同舟云学术

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Published:2019-03-26 Issue: Volume: Page:
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Container-title:Metrology, Inspection, and Process Control for Microlithography XXXIII
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Author:

Herrera Pedro,Gao Kun,Dror Chen,Hajaj Eitan,Volfman Alon A.,Yohanan Raviv,Ramanathan Vidya,Naipak Victoria,Milo Renan,Yaziv Tal,BenDavid Nir,Wang Meng,Mei Hao,Li Weihua,Gao Xindong,Yang Dongyue,Wong Cheuk Wun,Gutjahr Karsten,Hao Xueli,Joung Tony,Bellah Md. Motasim,Park DeNeil,Zhou Yue,Gottipati Abhishek

Publisher

SPIE

Reference7 articles.

1. Spectral tunability for accuracy, robustness, and resilience;Peled,2018

2. Accuracy in optical overlay metrology;Bringoltz,2016

3. Special Section Guest Editorial: Holistic/Hybrid Metrology

4. Diffraction order control in overlay metrology: a review of the roadmap options

5. Differential signal scatterometry overlay metrology: an accuracy investigation

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