ArF-laser-induced absorption in fused silica exposed to low fluence at 2000 Hz-Reference-Cited by-同舟云学术

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ArF-laser-induced absorption in fused silica exposed to low fluence at 2000 Hz

Published:2001-09-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Moll Johannes

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Morphological and ablation characteristics of brass and fused silica after interaction with ArF excimer laser;Optik;2022-07

2. Multipulse degradation of fused silica surfaces at 351 nm;Laser-Induced Damage in Optical Materials: 2015;2015-11-23

3. Gigashot optical degradation in silica optics at 351 nm;Optics Express;2015-02-10

4. Accelerated lifetime testing of fused silica for deep ultraviolet laser applications revised;Optical Engineering;2014-08-11

5. Accelerated life time testing of fused silica for DUV laser applications revised;SPIE Proceedings;2013-11-14

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