Overlay run-to-run control based on device structure measured overlay in DRAM HVM-Reference-Cited by-同舟云学术

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Overlay run-to-run control based on device structure measured overlay in DRAM HVM

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Metrology, Inspection, and Process Control for Microlithography XXXIII
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Author:

Chu Hsiao Lun,Huang Foster,Tottewitz Steven,Habets Boris,Lomtscher Patrick,Hsu Hsiao-Lin,Chiu Afu,Liu Rex H.

Publisher

SPIE

Reference3 articles.

1. Overlay leaves litho: Impact of non-litho processes on overlay and improvement solutions;Ruhm,2014

2. Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections;Kubis,2017

3. High-volume manufacturing device overlay process control;Lee,2017

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Overlay control improvements through dynamic sampling;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

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