1. Underlayer designs to enhance the performance of EUV resists;Hao,2009
2. Development of resist material and process for hp-2X-nm devices using EUV lithography;Matsunaga,2010
3. Pattern transfer process development for EUVL;Kawamura,2009
4. The novel spin-on hard mask and ultra thin UL material for EUVL;Sakamoto,2012
5. EUV sensitive Si containing Hard Mask (EUV Si-HM) for PTD and NTD process in EUVL;Shibayama,2013