Integration of EUV lithography in the fabrication of 22-nm node devices-Reference-Cited by-同舟云学术

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Integration of EUV lithography in the fabrication of 22-nm node devices

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies
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Author:

Wood Obert,Koay Chiew-Seng,Petrillo Karen,Mizuno Hiroyuki,Raghunathan Sudhar,Arnold John,Horak Dave,Burkhardt Martin,McIntyre Gregory,Deng Yunfei,La Fontaine Bruno,Okoroanyanwu Uzodinma,Tchikoulaeva Anna,Wallow Tom,Chen James H.-C.,Colburn Matthew,Fan Susan S.-C.,Haran Bala S.,Yin Yunpeng

Publisher

SPIE

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interface heterogeneity of periodic multilayer mirrors investigated by X-ray fluorescence, scattering spectroscopy, and mathematical methods of statistics;Surfaces and Interfaces;2022-10

2. 极紫外-真空紫外薄膜光学元件研究;Acta Optica Sinica;2022

3. Compensation of EUV lithography mask blank defect based on an advanced genetic algorithm;Optics Express;2021-08-23

4. Characteristics of discharge and beyond extreme ultraviolet spectra of laser induced discharge gadolinium plasma;Optics & Laser Technology;2021-06

5. A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments;IET Circuits, Devices & Systems;2021-03-29

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