Author:
Mesawich Michael,Sevegney Michael,Gotlinsky Barry,Reyes Santos,Abbott Patrick,Marzani Jeremy,Rivera Mario
Cited by
2 articles.
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1. New PE filter for advanced photolithography process;Advances in Patterning Materials and Processes XLI;2024-04-09
2. Novel Fast Etch Rate BARC for ArF Immersion Lithography;Journal of Photopolymer Science and Technology;2018-06-25