Author:
Tanabe Mana,Takai Kosuke,Otsubo Kyo,Umezawa Kaori,Iinuma Minako,Sakurai Hideaki,Kanamitsu Shingo
Reference2 articles.
1. Solid Phase Clean: Improving Performance for Smaller Particle Removal without Pattern Damage and Film Loss
2. E. Tejnil, T. Liang, F. O. Eschbach, and A. R. Stivers, Photomask Fabrication Technology, The McGraw-Hill, 2005: 404–408
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Freeze point monitoring system for freeze cleaning method;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16
2. Unique freeze cleaning technology;Advances in Patterning Materials and Processes XXXVII;2020-03-23