A model based OPC method to add serifs for corner rounding design of CMOS image sensor-Reference-Cited by-同舟云学术

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A model based OPC method to add serifs for corner rounding design of CMOS image sensor

Published:2019-09-26 Issue: Volume: Page:
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Container-title:Photomask Technology 2019
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Author:

Huang Zengzhi,Ni Lingyun,Fujii Koichi,Huang Xiaolu

Publisher

SPIE

Reference9 articles.

1. Use of a single size square serif for variable print bias compensation in microlithography: method, design, and practice;Alexander,1989

2. Analysis of OPC Features in Binary Masks at 193nm;Konstantinos,2000

3. Unified rule based correction for corners in proximity lithography mask using high resolution features

4. Line End Optimization through Optical Proximity Correction (OPC) - a Case Study;Dyiann,2006

5. Suppressing rippling with minimized corner rounding through OPC fragmentation optimization;Jingyu,2016

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