-Reference-Cited by-同舟云学术

Performance properties of near-monodisperse novolak resins

Author:

Allen Robert D.,Chen K. Rex,Gallagher-Wetmore Paula M.

Publisher

SPIE

Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Novolak resins and the microelectronic revolution;Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-07-01

2. Positive-Working Photoresist Based on a First-Generation Dendrimer Consisting of 3,5-Bis(tetrahydropyranyloxy)benzyl Units;Journal of Photopolymer Science and Technology;2008

3. Supercritical Carbon Dioxide in Semiconductor Cleaning;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09

4. Elevated Pressure CO2-Based Fluids Containing Polar Co-Solvents for Cleaning in Microelectronic Device Fabrication;Handbook for Cleaning/Decontamination of Surfaces;2007

5. Positive- and Negative-Tone CVD Polyacrylic Electron-Beam Resists Developable by Supercritical CO2;Chemical Vapor Deposition;2006-05

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