Wafer flatness modeling for scanning steppers
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SPIE
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Determination of silicon wafer site flatness using dual heterodyne interferometers with sub-nanometer precision;Review of Scientific Instruments;2020-06-01
2. Wafer Flatness Measurement System with Sub-Nanometer Precision Cancelling the Mechanical Vibration Using Accelerometers;Journal of the Society of Materials Science, Japan;2019-10-15
3. Wafer Flatness Measurement System with Sub-Nanometer Precision Cancelling the Noise Caused by a Light Source Using Dual Heterodyne Interferometer;Journal of the Society of Materials Science, Japan;2018-09-15
4. An Electronics Division Retrospective (1952-2002) and Future Opportunities in the Twenty-First Century;Journal of The Electrochemical Society;2002
5. Application of CD error budget analysis to ArF scanner performance;SPIE Proceedings;2001-09-14
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