1. Evalution of the attenuated PSM performance as the shifter transmittance and illumination systems;Kim,1999
2. A novel high-transmission phase shift mask for ArF lithographic performance enhancement;Naoto,2020
3. Contribution of EUV mask CD variability on LCDU;Qi,2017
4. Development of high-transmittance phase-shifting mask for ArF immersion lithography;Ahn,2015