Assessment of OPC effectiveness using two-dimensional metrics-Reference-Cited by-同舟云学术

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Assessment of OPC effectiveness using two-dimensional metrics

Published:2002-07-15 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Wiaux Vincent,Philipsen Vicky,Jonckheere Rik M.,Vandenberghe Geert,Verhaegen Staf,Hoffmann Thomas,Ronse Kurt G.,Howard William B.,Maurer Wilhelm,Preil Moshe E.

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Line end optimization through optical proximity correction (OPC): a case study;SPIE Proceedings;2006-03-10

2. Overbake and resist formulation: improved depth of focus and small line printing;Journal of Micro/Nanolithography, MEMS, and MOEMS;2005-01-01

3. Determining the transfer function of a mask fabrication process;SPIE Proceedings;2004-06-02

4. January 2004 update on the SEMI standards task force on photomask qualification terminology;SPIE Proceedings;2004-06-02

5. Integrated OPC approach to line-end shortening effects on the photomask and silicon levels for ArF attenuated PSM lithography;SPIE Proceedings;2004-05-28

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