1. M. J. Bowden, “Materials for Microlithography,” L. F. Thompson, C. G. Wilson, and J. M. J. Frechnet, Eds., Ch. 3, ACS Symp. Ser. 266.
2. L. F. Thompson and M. J. Bowden, “Introduction to Microlithography,” L. F. Thompson, C. G. Wilson, and M. J. Bowden, Eds., Ch. 4, ACS Symp. Ser. 219.
3. PGMA as a High Resolution, High Sensitivity Negative Electron Beam Resist
4. Negative Electron Resists for Direct Device Lithography: I . Initial Material Survey