Influence of evaporation rate and chamber pressure on the FUV reflectance and physical characteristics of aluminum films-Reference-Cited by-同舟云学术

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Influence of evaporation rate and chamber pressure on the FUV reflectance and physical characteristics of aluminum films

Published:2021-08-20 Issue: Volume: Page:
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Container-title:UV/Optical/IR Space Telescopes and Instruments: Innovative Technologies and Concepts X
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Author:

Quijada Manuel A.,Del Hoyo Javier,Gray Emrold,Richardson J. Grabriel,Howe Andrew,Rodriguez de Marcos Luis,Sheikh David

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Passivation of aluminum mirrors with SF₆- or NF₃-based plasmas;Optical Materials Express;2023-10-09

2. Cryolite overcoated aluminum reflectors for far-ultraviolet spectroscopy;UV/Optical/IR Space Telescopes and Instruments: Innovative Technologies and Concepts XI;2023-10-04

3. Electron beam-generated plasmas in NF3 environments for the passivation of UV/O/IR mirrors;UV/Optical/IR Space Telescopes and Instruments: Innovative Technologies and Concepts XI;2023-10-04

4. Optimizing the growth conditions of Al mirrors for superconducting nanowire single-photon detectors;Materials for Quantum Technology;2023-07-14

5. Pinholes in Al/MgF₂;Applied Optics;2023-04-03

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