Author:
Kostko Oleg,McAfee Terry,Naulleau Patrick
Cited by
2 articles.
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1. Role of resist components in electron emission and capture;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21
2. Dissociative photoionization of EUV lithography photoresist models;Advances in Patterning Materials and Processes XL;2023-05-01