Challenge of high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM-Reference-Cited by-同舟云学术

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Challenge of high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Published:2019-09-26 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2019
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Author:

Mizoguchi Hakaru,Nakarai Hiroaki,Abe Tamotsu,Tanaka Hiroshi,Watanabe Yukio,Hori Tsukasa,Shiraishi Yutaka,Yanagida Tatsuya,Sumangne Georg,Yamada Tsuyoshi,Saitou Takashi

Publisher

SPIE

Reference26 articles.

1. EUV Lithography with the Alpha Demo Tools: status and challenges;Noreen,2007

2. Nikon EUVL development progress update;Takaharu,2008

3. EUV into production with ASML’s NXE platform;Christian,2010

4. Performance validation of ASML’s NXE:3100;Christian,2011

5. ASML’s NXE platform performance and volume Introduction;Rudy,2013

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1. 极紫外光刻光源的研究进展及发展趋势;Laser & Optoelectronics Progress;2022

2. Absorption of laser radiation in a laser-produced plasma of Xe: hydrodynamic effects and nonequilibrium ionization;Journal of Physics D: Applied Physics;2021-12-07

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