Exploration of resist effect in source mask optimization-Reference-Cited by-同舟云学术

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Exploration of resist effect in source mask optimization

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXI
language:
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Author:

Chen Ao,Foong Yee Mei,Maeng Jae Yeol,Jain Nikhil,McDermott Steve

Publisher

SPIE

Reference10 articles.

1. Optimum mask and source patterns to print a given shape;Rosenbluth,2001

2. An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging;Hsu,2008

3. Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance;Hsu,2009

4. Source Mask Optimization methodology (SMO);Zhang,2012

5. Source-mask optimization incorporating a physical resist model and manufacturability constraints;Mülders,2012

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Predicting the critical features of the chemically-amplified resist profile based on machine learning;Advances in Patterning Materials and Processes XL;2023-05-01

2. Multi-objective adaptive source optimization for full chip;Applied Optics;2021-03-15

3. Fast nonlinear compressive sensing lithographic source and mask optimization method using Newton-IHTs algorithm;Optics Express;2019-01-28

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