SEM contour based metrology for microlens process studies in CMOS image sensor technologies-Reference-Cited by-同舟云学术

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SEM contour based metrology for microlens process studies in CMOS image sensor technologies

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXI
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Author:

Lakcher Amine,Bidault Laurent,Ducoté Julien,Mortini Etienne,Ostrovsky Alain,Le-Gratiet Bertrand,Berthier Ludovic,Jamin-Mornet Clémence,Besacier Maxime

Publisher

SPIE

Reference17 articles.

1. Translation of lithography variability into after-etch performance: monitoring of golden hotspot;Jo,2016

2. Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology;Lakcher,2017

3. Advanced in-production hotspot prediction and monitoring with micro-topography;Fanton,2017

4. Advanced metrology by offline SEM data processing;Lakcher,2017

5. Etude des propriétés et des mécanismes de mise en forme des résines photolithographiques pour une application capteurs d’images CMOS avancés;Audran,2007

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 3D SEM metrology of microstructures for high volume manufacturing;38th European Mask and Lithography Conference (EMLC 2023);2023-10-05

2. Joint Demosaicing and Fusion of Multiresolution Coded Acquisitions: A Unified Image Formation and Reconstruction Method;IEEE Transactions on Computational Imaging;2023

3. 3D resist reflow compact model for imagers microlens shape optimization;Design-Process-Technology Co-optimization for Manufacturability XIII;2019-03-20

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