A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks-Reference-Cited by-同舟云学术

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A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
Short-container-title:

Author:

Yoshitake Shushuke,Fernandez Sara,Mochi Iacopo,Helfenstein Patrick,Rajendran Rajeev,Kazazis Dimitrios,Ekinci Yasin

Publisher

SPIE

Reference22 articles.

1. EUV mask absorber characterization and selection;Yan,2000

2. Mask diffraction analysis and optimization for EUV masks;Erdmann,2009

3. Study of alternative capping and absorber layers for extreme ultraviolet (EUV) masks for sub-16nm half-pitch nodes;Rastegar,2014

4. Reducing EUV mask 3D effects by alternative metal absorbers;Philipsen,2017

5. Update on optical material properties for alternative EUV mask absorber materials;Scholze,2017

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lensless EUV Lithography and Imaging;Synchrotron Radiation News;2019-07-04

2. Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-03-18

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