Current developments of a high-performance CA resist for mask-making application-Reference-Cited by-同舟云学术

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Current developments of a high-performance CA resist for mask-making application

Published:2003-08-26 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Huang Wu-Song,He Wei,Li Wenjie,Moreau Wayne M.,Lang Robert,Medeiros David R.,Petrillo Karen E.,Mahorowala Arpan P.,Angelopoulos Marie,Deverich Christina,Huang Chester,Rabidoux Paul A.

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of Complex Metallic Nanostructures by Nanoskiving;ACS Nano;2007-10-31

2. New Approaches to Nanofabrication: Molding, Printing, and Other Techniques;Chemical Reviews;2005-03-04

3. The convergence of top-down and bottom-up nanofabrication: formation of 3D structures;SPIE Proceedings;2005-01-19

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